Projects funded by the NCN

Information on the principal investigator and host institution

Information of the project and the call

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High resolution optical and electron beam patterning processes with new ionic liquid based resists

2019/35/B/ST8/03736

Keywords:

photolithography e-beam lithography polymerizable ionic liquid photoresist

Descriptors:

  • ST8_001:

Panel:

ST8 - Production and processes engineering: modelling, product design, process design and control, construction methods and engineering, power units and systems

Host institution :

Instytut Technologii Materiałów Elektronicznych

woj. mazowieckie

Other projects carried out by the institution 

Principal investigator (from the host institution):

dr Katarzyna Małgorzata Komorowska 

Number of co-investigators in the project: 9

Call: OPUS 18 - announced on 2019-09-16

Amount awarded: 1 351 320 PLN

Project start date (Y-m-d): 2020-08-27

Project end date (Y-m-d): 2023-05-26

Project duration:: 33 months (the same as in the proposal)

Project status: Project settled

Project description

Download the project description in a pdf file

Note - project descriptions were prepared by the authors of the applications themselves and placed in the system in an unchanged form.

Information in the final report

  • Publication in academic press/journals (6)
  • Articles in post-conference publications (1)
  1. Interaction of electron beam with ionic liquids and its application for micropatterning
    Authors:
    Krzysztof Rola, Adrian Zając, Andrea Szpecht, Dominik Kowal, Janna Cybinska, Marcin Śmiglak
    Academic press:
    European Polymer Journal (rok: 2021, tom: 5, strony: 110615/1-110615/12), Wydawca: Elsevier
    Status:
    Published
    DOI:
    10.1016/j.eurpolymj.2021.110615 - link to the publication
  2. Mono N‐Alkylated DABCO-Based Ionic Liquids and Their Application as Latent Curing Agents for Epoxy Resins
    Authors:
    Dawid Zielinski, Andrea Szpecht, Paulina Hinc, Hieronim Maciejewski, and Marcin Smiglak
    Academic press:
    ACS Applied Polymer Materials (rok: 2021, tom: 3, strony: 5481-5493), Wydawca: ACS Publications
    Status:
    Published
    DOI:
    10.1021/acsapm.1c00777 - link to the publication
  3. Optical Fiber Grating-Prism Fabrication by Imprint Patterning of Ionic-Liquid-Based Resist
    Authors:
    Natalia Turek, Piotr Pala, Andrea Szpecht, Adrian Zając, Teresa Sembratowicz, Tadeusz Martynkien, Marcin Śmiglak, K. Komorowska
    Academic press:
    International Journal of Molecular Sciences (rok: 2023, tom: 24, strony: 1370), Wydawca: MDPI
    Status:
    Published
    DOI:
    10.3390/ijms24021370 - link to the publication
  4. Thermal and Electrochemical Properties of Ionic Liquids Bearing Allyl Group with Sulfonate-Based Anions—Application Potential in Epoxy Resin Curing Process
    Authors:
    Andrea Szpecht, Dawid Zieliński, Maciej Galiński, Marcin Śmiglak
    Academic press:
    Molecules (rok: 2023, tom: 28, strony: 709), Wydawca: MDPI
    Status:
    Published
    DOI:
    10.3390/molecules28020709 - link to the publication
  5. Grism fabricated on the end-face of an optical fiber
    Authors:
    Piotr Pala, Katarzyna Komorowska, Andrea Szpecht, Tadeusz Martynkien
    Academic press:
    Optics Express (rok: 2023, tom: 31, strony: 23362-23371), Wydawca: Optica Publishing Group
    Status:
    Published
    DOI:
    10.1364/OE.491386 - link to the publication
  6. Synthesis and Behavior of Hexamethylenetetramine-Based Ionic Liquids as an Active Ingredient in Latent Curing Formulations with Ethylene Glycol for DGEBA
    Authors:
    Dawid Zieliński, Andrea Szpecht, Paulina Hinc, Marcin Śmiglak
    Academic press:
    Molecules (rok: 2023, tom: 28, strony: 892), Wydawca: MDPI
    Status:
    Published
    DOI:
    10.3390/molecules28020892 - link to the publication
  1. Electron beam and optical patterning of polymerizable ionic liquid-based resists
    Authors:
    Natalia Turek, Andrea Szpecht, Aleksandra Szymańska, Tomasz Stefaniuk, Katarzyna Komorowska
    Conference:
    Advances in Patterning Materials and Processes XL (rok: 2023, tom: SPIE: Advanced Lithography and Patterning, strony: 124981S-1 - 124981S-5), Wydawca: SPIE Proceedings
    Data:
    konferencja 26.02-02.03.2023
    Status:
    Published
    DOI:
    10.1117/12.2658445 - link to the publication

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