2011/03/N/ST7/00451
Keywords:
photonic crystal line defect optimization interference lithography electron beam lithography focused ion beam
Descriptors:
Panel:
ST7 - Systems and communication engineering: electronics, communication, optoelectronics
Host institution :
POLITECHNIKA WROCŁAWSKA
woj. dolnośląskie
Principal investigator (from the host institution):
Number of co-investigators in the project: 2
Call: PRELUDIUM 2 - announced on 2011-09-15
Amount awarded: 276 180 PLN
Project start date (Y-m-d): 2012-08-07
Project end date (Y-m-d): 2016-08-06
Project duration:: 48 months (the same as in the proposal)
Project status: Project settled