Influence of phosphorus on electro-physical properties of dielectric layers obtained by thermal oxidation of 4H-SiC

2012/05/N/ST7/02035

Keywords

Descriptors

  • ST7_5: Mikro- i nanoelektronika, optoelektronika
  • ST7_2: Elektrotechnika, elektronika: półprzewodniki, elementy i układy, systemy

Panel

ST7 – Systems and communication engineering: electronics, communication, optoelectronics

Host institution

Politechnika Warszawska, Wydział Elektroniki i Technik Informacyjnych

Voivodeship: mazowieckie

Other projects carried out by the institution »

Principal investigator (from the host institution)

Krystian Bogumił Król

Number of co-investigators in the project: 3

Call

PRELUDIUM 3 – announced on 2012-03-15

Amount awarded
149 998 PLN
Project start date
2013-03-25
Project end date
2016-03-24
Project duration
36 months (the same as in the proposal)
Project status
Project settled

Equipment purchased [PL]

  1. Monitor LCD o wysokiej rozdzielczości. Cost: 1 200 PLN

Information in the final report

Publication in academic press/journals (4)

  1. Utlenianie węglika krzemu: charakteryzacja procesu i metody symulacji kinetyki

    Authors:
    K. Król, M. Sochacki, J. Szmidt
    Academic press:
    Elektronika: konstrukcje, technologie, zastosowania (year: 2014, volume: 55/7, pages: 141-148), Publisher: Sigma-Not
    Status:
    Published
    DOI:
    10.15199/ELE-2014-086 – link to the publication
  2. Depth Profile Analysis of Phosphorus Implanted SiC Structures

    Authors:
    P. Konarski, K. Król, M. Miśnik, M. Sochacki, J. Szmidt, M. Turek, J. Żuk
    Academic press:
    Acta Physica Polonica A (year: 2015, volume: 128, pages: 864-866), Publisher: Polish Academy of Sciences Institute of Physics
    Status:
    Published
    DOI:
    10.12693/APhysPolA.128.864 – link to the publication
  3. Influence Of Phosphorus Implantation On Electrical Properties Of Al/SiO2/4H-SiC MOS structure

    Authors:
    K. Król, M. Sochacki, M. Turek, J. Żuk, P. Borowicz, D. Teklińska, P. Konarski, M. Miśnik, A. Domanowska, A. Michalewicz, J. Szmidt
    Academic press:
    Material Science Forum (year: 2015, volume: 821-823, pages: 496-499), Publisher: Trans-tech Publications
    Status:
    Published
    DOI:
    10.4028/www.scientific.net/MSF.821-823.496 – link to the publication
  4. The Effect of Phosphorus Incorporation into SiO_2/4H-SiC (0001) Interface on Electrophysical Properties of MOS Structure

    Authors:
    K. Król, P. Konarski, M. Miśnik, M. Sochacki, J. Szmidt
    Academic press:
    Acta Physica Polonica A (year: 2014, volume: 126/5, pages: 1100-1103), Publisher: Polska Akademia Nauk
    Status:
    Published
    DOI:
    10.12693/APhysPolA.126.1100 – link to the publication

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