Novel van der Waals heterostructures for next-generation nano and optoelectronics
2020/39/O/ST5/00416
Keywords
Descriptors
- ST3_004: Własności elektronowe materiałów, powierzchni, złącz międzywarstwowych, nanostruktur, itp.
- ST5_012: Metody otrzymywania materiałów /nanomateriałów
- ST5_001: Właściwości strukturalne materiałów
Panel
ST5 – Materials: materials synthesis, structure-properties relations, advanced and functional materials with designed properties, (macro)molecular architecture, material engineering
Host institution
Politechnika Warszawska, Wydział Fizyki
Voivodeship: mazowieckie
Principal investigator (from the host institution)
Number of co-investigators in the project: 2
Call
PRELUDIUM BIS 2 – announced on 2020-09-15
- Amount awarded
- 465 900 PLN
- Project start date
- 2021-10-01
- Project end date
- 2025-09-30
- Project duration
- 48 months (the same as in the proposal)
- Project status
- Project completed
Project description
Download the project description in a pdf file
Note — project descriptions were prepared by the authors of the applications themselves and placed in the system in an unchanged form.
Information in the final report
Publication in academic press/journals (1)
-
Contact Resistance Engineering in WS2-Based FET with MoS2 Under-Contact Interlayer: A Statistical Approach
- Authors:
- Małgorzata Giza, Michał Świniarski, Arkadiusz P. Gertych, Karolina Czerniak-Łosiewicz, Maciej Rogala, Paweł J. Kowalczyk, Mariusz Zdrojek
- Academic press:
- ACS Applied Materials & Interfaces (year: 2024, volume: 16, pages: 6947-48686), Publisher: American Chemical Society
- Status:
- Published
- DOI:
- 10.1021/acsami.4c09688 – link to the publication