Projects funded by the NCN
Atomic Layer Deposition for tailored bottom-top growth of MAX and MXene films.
2016/22/Z/ST5/00693
Keywords:
atomowe osadzanie warstw ALD fazy MAX MXene
Descriptors:
- ST5_4: Thin films
- ST5_3: Surface modification
- ST5_19:
Panel:
ST5 - Materials: materials synthesis, structure-properties relations, advanced and functional materials with designed properties, (macro)molecular architecture, material engineering
Host institution :
Politechnika Łódzka, Wydział Mechaniczny
woj. łódzkie
Principal investigator (from the host institution):
Number of co-investigators in the project: 4
Call: UNISONO
Amount awarded: 453 759 PLN
Project start date (Y-m-d): 2017-09-01
Project end date (Y-m-d): 2021-05-31
Project duration:: 45 months (the same as in the proposal)
Project status: Project settled
Information in the final report
- Publication in academic press/journals (1)
- Articles in post-conference publications (1)
- Amorphous AlN films grown by ALD from trimethylaluminum and monomethylhydrazineAuthors:Roman G. Parkhomenko, Oreste De Luca, Łukasz Kołodziejczyk, Evgeny Modin, Petra Rudolf, Diego Martínez Martínez, Luis Cunha and Mato KnezAcademic press:Dalton Transactions (rok: 2021, tom: 50, strony: 15062 - 15070), Wydawca: Royal Society of ChemistryStatus:PublishedDOI:10.1039/d1dt02529e - link to the publication
- Frictional behaviour of TiN coatings grown by atomic layer depositionAuthors:Wojciech Grodzicki, Lukasz KolodziejczykConference:1st International Conference Functional and Engineering Materials - FEM 2019, Lodz, Poland (rok: 2020, ), Wydawca: IOP Publishing LtdData:konferencja 43754Status:Published